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Die Anwendung der Vakuumbeschichtungstechnik in der Glasindustrie = L'utilisation de la technique de revêtement sous vide dans l'industrie du verre = Application of vacuum coating technology in the glass industryDITTMER, G.Sprechsaal (1976). 1986, Vol 119, Num 9, pp 745-749, issn 0341-0676, 4 p.Article

Vacuum deposition and polymerization of acetylene substituted fluorenesLEE, Changjin; KANG, Yongku; LEE, Sungkoo et al.Molecular crystals and liquid crystals science and technology. Section A, Molecular crystals and liquid crystals. 2000, Vol 349, pp 503-506, issn 1058-725XConference Paper

A new shutter design with a modified effusion cell for use in an ultrahigh vacuum systemLU, H. C; CHAN, W. S; SADWICK, L et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1990, Vol 8, Num 2, pp 811-815, issn 0734-2101Article

Aluminium thin film growth on a Ru(0001) surfaceCEBALLOS, G; THEIS, M; PELZER, T et al.Surface science. 1995, Vol 331-333, pp 952-956, issn 0039-6028, bConference Paper

STM study of the Ge growth mode on Si(001) substratesTOMITORI, M; WATANABE, K; KOBAYASHI, M et al.Applied surface science. 1994, Vol 76-77, Num 1-4, pp 322-328, issn 0169-4332Conference Paper

Design and performance of a cylindrical reflection mirror analyzer for low energy ion scattering studiesYI-SHA KU; CHING-SHEN SU.Review of scientific instruments. 1991, Vol 62, Num 6, pp 1471-1474, issn 0034-6748, 4 p.Article

Preparation of low-energy reference electron source with ¹⁶⁹YbKAWAKAMI, H; NISIMURA, K; NAGAFUCHI, T et al.Japanese journal of applied physics. 1988, Vol 27, Num 8, pp 1488-1891, issn 0021-4922, 1Article

Obtention de revêtements de zirconium par un procédé «iodure» dans un système à circulationDUDNIK, S. F; MIROSHNICHENKO, K. V; SAGALOVICH, V. V et al.Fizika i himiâ obrabotki materialov. 1986, Num 4, pp 58-60, issn 0015-3214Article

Inorganic layers on polymeric films: Influence of defects and morphology on barrier propertiesHANIKA, Markus; LANGOWSKI, Horst-Christian; MOOSHEIMER, Ulrich et al.Chemical engineering & technology. 2003, Vol 26, Num 5, pp 605-614, issn 0930-7516, 10 p.Article

Reinigen vor dem Vakuumbeschichter = Cleaning for vacuum coatingsKOCH, H.Metalloberfläche. 1999, Vol 53, Num 6, pp 21-23, issn 0026-0797Article

Vacuum arc deposition as a complementary technology to laser processingVERSHININ, N. F; GLEBOVSKY, V. G; STRAUMAL, B. B et al.Applied surface science. 1997, Vol 109-10, pp 437-441, issn 0169-4332Conference Paper

Characterization of thin film n-Cds/p-CdTe heterojunctionsMAHAMMAD HUSSAIN, O; JAYARAMA REDDY, P.Vacuum. 1991, Vol 42, Num 10-11, pp 657-659, issn 0042-207XArticle

Textured structure of diamond-like carbon prepared without hydrogenCOLLINS, C. B; DAVANLOO, F; JUENGERMAN, E. M et al.Surface & coatings technology. 1991, Vol 47, Num 1-3, pp 754-760, issn 0257-8972Conference Paper

Performance of vacuum sealing system in continuous zinc vapor deposition line = Utilisation d'un dispositif étanche au vide dans une ligne continue de dépôt de vapeur de zincMAEDA, M; NAKAMURA, K; ITO, T et al.Revue de métallurgie (Paris). 1988, Vol 85, Num 4, pp 341-350, issn 0035-1563Conference Paper

Design and implementation of a magnetic drive retrofit to the Vacuum Generator's venetian style viewport shutter assemblyROULEAU, C. M; PARK, R. M.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 464-465, issn 0734-2101Article

Application of centrifugal vacuum concentrators in residue analysisMALISCH, R.Fresenius' journal of analytical chemistry. 1991, Vol 341, Num 7-8, pp 449-456, issn 0937-0633Article

Web metallizing with dense, directional and energetic Al-vapour jets : a challenge to conventional evaporatorsDE RUDNAY, A.Vacuum. 1991, Vol 42, Num 10-11, pp 649-655, issn 0042-207XArticle

Un regard scientifique sur les traitements de surfaceGalvano organo. Le professionnel des traitements de surface. 1991, Vol 60, Num 620, pp 1003-1008Article

Optimierung von aluminiumbedampftem Bandstahl (EBAL) = Optimation of steel strip vapour coated with aluminium (EBAL)ANTON, K.Neue Hütte. 1987, Vol 32, Num 2, pp 69-70, issn 0028-3207Article

A rotating substrate platen for use in thin-film deposition systemsDREWERY, J. S; BEADLE, A. R.Journal of physics. E. Scientific instruments. 1989, Vol 22, Num 1, pp 61-62, issn 0022-3735, 2 p.Article

Quelques particularités de la cinétique du processus de formation de revêtements optiquesLEVINA, M. D; STOLOV, E. G.Optika i spektroskopiâ. 1986, Vol 61, Num 3, pp 624-627, issn 0030-4034Article

Tetrathiafulvalene derivatives for organic field effect transistorsMAS-TORRENT, Marta; ROVIRA, Concepcio.Journal of material chemistry. 2006, Vol 16, Num 5, pp 433-436, issn 0959-9428, 4 p.Article

Mechanism of E' center generation in SiO₂ film by ion and neutral beam bombardmentYOKOGAWA, K; YAJIMA, Y; MIZUTANI, T et al.Japanese journal of applied physics. 1991, Vol 30, Num 11B, pp 3199-3202, issn 0021-4922, 1Article

Evaporation dissociative sous vide d'une céramique de chromate(III) d'yttrium dopé de calciumDON, A. T; PAKHOMOV, E. P; REZNIKOVA, E. D et al.Teplofizika vysokih temperatur. 1988, Vol 26, Num 6, pp 1094-1098, issn 0040-3644Article